San Francisco, CA – February 26th, 2024
Happening this Thursday 2/29 at 8:30 am! We invite you to come to our technical presentation at SPIE Advanced Lithography. We’ll talk about the latest development of our High Refractive Index (HRI) materials, which can be directly patterned using photolithography, electron beam lithography, and nanoimprint lithography.
SPIE Conference 12956: Novel Patterning Technologies 2024
Presentation Title: Direct patterning of high refractive index optical materials for photonic applications [12956-34]
Presentation Date/Time: 29 February 2024 8:30 AM
Location: 26 – 29 February 2024 | Convention Center, Room 210A
See you in San Jose!
