Nanoimprinting enables precise, reproducible fabrication for high-volume photonic and optoelectronic devices. A critical factor in its success is the availability of high-refractive-index resins.
At HighRI, we offer ultra-high refractive index materials optimized for nanoimprint lithography (NIL), with refractive indices ranging from 1.65 to 2.00 at 590 nm, formulated in two types:
HighRI Optics’ resins are versatile and fully customizable to meet diverse application and manufacturing needs.
“Nanoimprinting was performed using SmartNIL® by EVG”
Versatile Materials for Nanoimprint Lithography and Beyond
Cutting-Edge Materials for Nanoimprint Lithography & Beyond
High-Performance Materials for NIL & Beyond
Key Applications
Our materials drive innovation and enable next-generation photonic advancements across industries.
HighRI Optics, Inc. is a spin-off company of aBeam Technologies, Inc. headquartered in Oakland, CA.
We develop advanced optical materials and applications. Our proprietary and patented high refractive index optical materials enable advanced optics applications. Fiber nanoimprint technology dramatically simplifies light manipulation at the nanometer scale.
