June 24, 2025
We are honored to announce that HighRI Optics Inc. has been invited to speak at the 42nd International Conference of Photopolymer Science and Technology (ICPST-42), taking place June 24–27, 2025, at Arcrea HIMEJI in Himeji City, Hyogo, Japan.
Organized by the Society of Photopolymer Science and Technology (SPST), ICPST is a premier global forum for cutting-edge research in photopolymer materials, advanced lithography, and nanotechnology. This year’s conference features symposia on EUV lithography, nanoimprint, directed self-assembly, and high-performance resins—making it a perfect venue for sharing our latest innovations.
Our invited talk will highlight recent advancements in high-refractive-index materials for UV nanoimprint lithography (UV-NIL), including filler-free formulations and tunable optical properties. We’ll also discuss how our materials are enabling next-generation photonic and optoelectronic devices through low optical loss and precise pattern fidelity.
We look forward to engaging with fellow researchers, industry leaders, and collaborators at this exciting event. If you’re attending ICPST-42, we’d love to connect—come find us at the Nanoimprint Symposium!
For more information about the conference, visit the official ICPST-42 website.
