OVERVIEW
HighRI has created the high refractive index materials with high optical transparency in the visible region. The proprietary formulation enables to achieve nanoimprint compatible material with the highest refractive index (1.8 at 590 nm) without the addition of nanofillers (e.g. metal oxide nanoparticles). With the extensive knowledge and experience in the optical material formulation, our formulation can be customized to meet the application specific requirements.
KEY METRICS AND RESULTS
- The NIL materials developed have the highest refractive index without nanoparticles in the industry
- High refractive index materials are specially formulated to achieve high transmission and excellent pattternability.
- Indices from 1.8 to 2.0X
- Formulations are customizable based on the application needs
BENEFITS
HighRI’s high refractive index materials can be used for numerous applications to meet the existing fabrication process requirements and discover new opportunities.
Numerous Applications Are possible:
- UV and Thermal Nanoimprint Lithography with controllable residual layer
- High Resolution (sub-10 nm) Nanoimprinting
- Patterning with Photoresist
- Coating over nano/micro structures
- Droplet Dispensing
BENEFITS
HighRI’s high refractive index materials can be used for numerous applications to meet the existing fabrication process requirements and discover new opportunities.
Numerous Applications Are possible:
- UV and Thermal Nanoimprint Lithography with controllable residual layer
- High Resolution (sub-10 nm) Nanoimprinting
- Patterning with Photoresist
- Coating over nano/micro structures
- Droplet Dispensing
CHALLENGES
High refractive index materials can bring key optical advantages in a wide range of consumer devices. Polymer type high refractive index materials are desirable for processability and to meet the manufacturing needs. Conventional polymers (~ 1.5) are typically too low in the refractive index to meet the requirement of high-performance applications such as image sensors, LEDs, and anti-reflection coatings, and so on.
To enable smaller and more efficient photonic devices, the need for high refractive index materials are higher than ever.
The direct patterning of photonic devices using high refractive index materials and NIL are scalable, low-cost, and offers flexibility on the substrate choices. One of the key challenges are the commercial availabilities of the high-refractive index resins that can satisfy performance and processability.
APPROACH AND SOLUTIONS
HighRI worked to create new functional high refractive index materials that could be scalable at a high volume. These new solutions provide for optical materials that have a high refractive index, excellent optical transparency, and are compatible with NIL processes as well as a thin-film coating.